The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Feb. 13, 2012
Hung-hua Lin, Taipei, TW;
Li-cheng Chu, Taipei, TW;
Ming-tung Wu, Hsinchu, TW;
Yuan-chih Hsieh, Hsinchu, TW;
Lan-lin Chao, Sindian, TW;
Chia-shiung Tsai, Hsinchu, TW;
Hung-Hua Lin, Taipei, TW;
Li-Cheng Chu, Taipei, TW;
Ming-Tung Wu, Hsinchu, TW;
Yuan-Chih Hsieh, Hsinchu, TW;
Lan-Lin Chao, Sindian, TW;
Chia-Shiung Tsai, Hsinchu, TW;
Abstract
A method of forming of biological sensing structures including a portion of a substrate is recessed to form a plurality of mesas in the substrate. Each of the plurality of mesas has a top surface and a sidewall surface. A first light reflecting layer is deposited over the top surface and the sidewall surface of each mesa. A filling material is formed over a first portion of the first light reflecting layer. A stop layer is deposited over the filling material and a second portion of the first light reflecting layer. A sacrificial layer is formed over the stop layer and is planarized exposing the stop layer. A first opening is formed in the stop layer and the first light reflecting layer. A second light reflecting layer is deposited over the first opening. A second opening is formed in the second light reflecting layer.