The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2014

Filed:

Dec. 21, 2010
Applicants:

Tadakazu Sone, Tokyo, JP;

Yasuyuki Motoshima, Tokyo, JP;

Toru Maruyama, Tokyo, JP;

Katsutoshi Ono, Tokyo, JP;

Yoichi Shiokawa, Tokyo, JP;

Inventors:

Tadakazu Sone, Tokyo, JP;

Yasuyuki Motoshima, Tokyo, JP;

Toru Maruyama, Tokyo, JP;

Katsutoshi Ono, Tokyo, JP;

Yoichi Shiokawa, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B24B 55/02 (2006.01); B24B 37/015 (2012.01); B24B 37/34 (2012.01); B24B 37/10 (2012.01);
U.S. Cl.
CPC ...
B24B 37/015 (2013.01); B24B 55/02 (2013.01); B24B 37/34 (2013.01); B24B 37/10 (2013.01);
Abstract

An apparatus for polishing a substrate includes a rotatable polishing table supporting a polishing pad, a substrate holder configured to hold the substrate and press the substrate against a polishing surface of the polishing pad on the rotating polishing table so as to polish the substrate, and a pad-temperature detector configured to measure a temperature of the polishing surface of the polishing pad. The apparatus also includes a pad-temperature regulator configured to contact the polishing surface to regulate the temperature of the polishing surface, and a temperature controller configured to control the temperature of the polishing surface by controlling the pad-temperature regulator based on information on the temperature of the polishing surface detected by the pad-temperature detector.


Find Patent Forward Citations

Sone, Tadakazu. (2014). Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus (U.S. Patent No. 8845391). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8845391

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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