The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Dec. 21, 2010
Tadakazu Sone, Tokyo, JP;
Yasuyuki Motoshima, Tokyo, JP;
Toru Maruyama, Tokyo, JP;
Katsutoshi Ono, Tokyo, JP;
Yoichi Shiokawa, Tokyo, JP;
Tadakazu Sone, Tokyo, JP;
Yasuyuki Motoshima, Tokyo, JP;
Toru Maruyama, Tokyo, JP;
Katsutoshi Ono, Tokyo, JP;
Yoichi Shiokawa, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
An apparatus for polishing a substrate includes a rotatable polishing table supporting a polishing pad, a substrate holder configured to hold the substrate and press the substrate against a polishing surface of the polishing pad on the rotating polishing table so as to polish the substrate, and a pad-temperature detector configured to measure a temperature of the polishing surface of the polishing pad. The apparatus also includes a pad-temperature regulator configured to contact the polishing surface to regulate the temperature of the polishing surface, and a temperature controller configured to control the temperature of the polishing surface by controlling the pad-temperature regulator based on information on the temperature of the polishing surface detected by the pad-temperature detector.