The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Aug. 08, 2011
Applicants:

Muneyuki Fukuda, Kokubunji, JP;

Naomasa Suzuki, Hitachinaka, JP;

Tomoyasu Shojo, Saitama, JP;

Noritsugu Takahashi, Kokubunji, JP;

Hiroshi Suzuki, Koganei, JP;

Hiroshi Makino, Chino, JP;

Inventors:

Muneyuki Fukuda, Kokubunji, JP;

Naomasa Suzuki, Hitachinaka, JP;

Tomoyasu Shojo, Saitama, JP;

Noritsugu Takahashi, Kokubunji, JP;

Hiroshi Suzuki, Koganei, JP;

Hiroshi Makino, Chino, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); H01J 23/00 (2006.01); H01J 37/26 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01); G01K 7/00 (2006.01); G01N 23/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/263 (2013.01); G01N 23/22 (2013.01); H01J 37/222 (2013.01); H01J 37/28 (2013.01);
Abstract

This charged particle beam microscope is characterized by being provided with selection means () for a measurement processing method for detected particles () and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons () emitted from a sample () and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.


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