The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Jun. 17, 2013
Kla-tencor Corporation, Milpitas, CA (US);
Xuefeng Liu, San Jose, CA (US);
Yung-Ho Alex Chuang, Cupertino, CA (US);
John Fielden, Los Altos, CA (US);
Bin-Ming Benjamin Tsai, Saratoga, CA (US);
Jingjing Zhang, San Jose, CA (US);
KLA-Tencor Corp., Milpitas, CA (US);
Abstract
Systems and methods for process aware metrology are provided. One method includes selecting nominal values and one or more different values of process parameters for one or more process steps used to form the structure on the wafer, simulating one or more characteristics of the structure that would be formed on the wafer using the nominal values, and determining parameterization of the optical model based on how the one or more characteristics of the structure vary between at least two of the nominal values and the one or more different values.