The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Aug. 10, 2011
Chishio Koshimizu, Nirasaki, JP;
Kazuki Denpoh, Nirasaki, JP;
Chishio Koshimizu, Nirasaki, JP;
Kazuki Denpoh, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus capable of performing a uniform plasma process on a substrate by controlling a plasma distribution within a chamber to a desired state and uniformizing a plasma density within the chamber. The plasma processing apparatus includes an evacuable chamberfor performing a plasma process on a wafer W; a susceptorfor mounting the wafer W within the chamber; an upper electrode platefacing the susceptorwith a processing space S; a high frequency power supplyfor applying a high frequency power to one of the susceptorand the upper electrode plateto generate plasma within the processing space S; and an inner wall member facing the processing space S. Hollow cathodestoare formed at the upper electrode plateconnected with a DC power supplyfor adjusting a sheath voltage.