The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8828746 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 09, 2014

Filed:

Nov. 14, 2012
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Alan B. Botula, Essex Junction, VT (US);

Mark D. Jaffe, Shelburne, VT (US);

Alvin J. Joseph, Williston, VT (US);

Richard A. Phelps, Colchester, VT (US);

James Slinkman, Montpelier, VT (US);

Randy L. Wolf, Essex Junction, VT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A silicon device includes an active silicon layer, a buried oxide (BOX) layer beneath the active silicon layer and a high-resistivity silicon layer beneath the BOX layer. The device also includes a harmonic suppression layer at a boundary of the BOX layer and the high-resistivity silicon layer.


Find Patent Forward Citations

Botula, Alan. (2014). Compensation for a charge in a silicon substrate (U.S. Patent No. 8828746). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8828746

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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