The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2014

Filed:

Aug. 08, 2011
Applicants:

Alex Schrinsky, Boise, ID (US);

Anish Khandekar, Boise, ID (US);

Pavan Aella, Boise, ID (US);

Niraj B. Rana, Boise, ID (US);

Inventors:

Alex Schrinsky, Boise, ID (US);

Anish Khandekar, Boise, ID (US);

Pavan Aella, Boise, ID (US);

Niraj B. Rana, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods are disclosed that include selectively etching diffused regions to form recesses in semiconductor material, and forming charge storage structures in the recesses. Additional embodiments are disclosed.


Find Patent Forward Citations

Loading…