The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2014

Filed:

May. 22, 2008
Applicants:

Youval Nehmadi, Modiin, IL;

Rinat Shimshi, San Jose, CA (US);

Vicky Svidenko, San Jose, CA (US);

Alexander T. Schwarm, Austin, TX (US);

Sundar Jawaharlal, Glen Allen, VA (US);

Inventors:

Youval Nehmadi, Modiin, IL;

Rinat Shimshi, San Jose, CA (US);

Vicky Svidenko, San Jose, CA (US);

Alexander T. Schwarm, Austin, TX (US);

Sundar Jawaharlal, Glen Allen, VA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

In one embodiment, an inline defect analysis method includes receiving geometric characteristics of individual defects and design data corresponding to the individual defects, determining which of the individual defects are likely to be nuisance defects using the geometric characteristics and the corresponding design data, and refraining from sampling the defects that are likely to be nuisance defects.


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