The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
May. 25, 2010
Nicole Schoumans, 's Hertogenbosch, NL;
Everhardus Cornelis Mos, Best, NL;
Birgitt Noëlle Cornelia Liduine Hepp, Waalre, NL;
Remco Jochem Sebastiaan Groenendijk, Eindhoven, NL;
Nicole Schoumans, 's Hertogenbosch, NL;
Everhardus Cornelis Mos, Best, NL;
Birgitt Noëlle Cornelia Liduine Hepp, Waalre, NL;
Remco Jochem Sebastiaan Groenendijk, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method is described for obtaining information for use in modeling of a lithographic process. A pattern feature is formed on a target portion of a substrate by projecting a beam of radiation onto the target portion of the substrate. For that target portion the lithographic process is characterized by one or both of a first property that varies in a first direction along a surface of the substrate, and a second property that varies in a second direction along a surface of the substrate. A property of the pattern feature is measured. Using the measured property of the pattern feature and at least one of the first and second properties, information is obtained for use in modeling the process. The lithographic process may be or include the projection of the beam of radiation onto the surface of the substrate.