The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Oct. 08, 2009
Ryoji Nishio, Kudamatsu, JP;
Ken Yoshioka, Hikari, JP;
Saburou Kanai, Hikari, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Hideki Kihara, Kudamatsu, JP;
Koji Okuda, Kudamatsu, JP;
Ryoji Nishio, Kudamatsu, JP;
Ken Yoshioka, Hikari, JP;
Saburou Kanai, Hikari, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Hideki Kihara, Kudamatsu, JP;
Koji Okuda, Kudamatsu, JP;
Hitachi High Technologies Corporation, Tokyo, JP;
Abstract
A plasma processing apparatus includes a sample stage disposed at a lower part of a processing chamber, a bell jar made of an insulative material constituting an upper portion of a vacuum vessel, a coil antenna disposed outside and around the bell jar to which electric power is supplied so as to generate the plasma in a plasma generating space inside of the bell jar, and a Faraday shield mounted on the bell jar and disposed between an external surface of the bell jar and the coil antenna. A ring shaped member made of an electric conductive material is disposed inside of an inner surface of a ring portion of the processing chamber located below a skirt portion of the bell jar and constitutes a part of the processing chamber. The ring shaped member extends upwardly so as to cover a portion of an inner surface of the bell jar.