The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Apr. 20, 2009
Applicants:
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Andreas Fuchs, Meerbusch, DE;
Martyn John Coogans, Eindhoven, NL;
Inventors:
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Andreas Fuchs, Meerbusch, DE;
Martyn John Coogans, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.