The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Jan. 31, 2011
Hans Butler, Best, NL;
Emiel Jozef Melanie Eussen, Eindhoven, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
Cornelius Adrianus Lambertus DE Hoon, Best, NL;
Hans Butler, Best, NL;
Emiel Jozef Melanie Eussen, Eindhoven, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Harmen Klaas Van Der Schoot, Vught, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
Cornelius Adrianus Lambertus De Hoon, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.