The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2014
Filed:
May. 23, 2012
Applicants:
Chung-ming Wang, Chiayi, TW;
Yu Lun Liu, Beidou Township, Changhua County, TW;
Chia-chu Liu, Shin-Chu, TW;
Kuei-shun Chen, Hsin-Chu, TW;
Inventors:
Chung-Ming Wang, Chiayi, TW;
Yu Lun Liu, Beidou Township, Changhua County, TW;
Chia-Chu Liu, Shin-Chu, TW;
Kuei-Shun Chen, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a integrated circuit pattern. The method includes coating a photoresist layer on a substrate; performing a lithography exposure process to the photoresist layer; performing a multiple-step post-exposure-baking (PEB) process to the photoresist layer; and developing the photoresist layer to form a patterned photoresist layer.