The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2014

Filed:

Oct. 20, 2011
Applicants:

Jyun-siang Huang, Hsinchu, TW;

Wen-jer Tsai, Hsinchu, TW;

Inventors:

Jyun-Siang Huang, Hsinchu, TW;

Wen-Jer Tsai, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A memory and a manufacturing method thereof are provided. A plurality of stacked structures extending along a first direction is formed on a substrate. Each of the stacked structures includes a plurality of first insulating layers and a plurality of second insulating layers. The first insulating layers are stacked on the substrate and the second insulating layers are respectively disposed between the adjacent first insulating layers. A plurality of trenches extending along the first direction is formed in each of the stacked structures. The trenches are respectively located at two opposite sides of each of the second insulating layers. A first conductive layer is filled in the trenches. A plurality of charge storage structures extending along a second direction is formed on the stacked structures and a second conductive layer is formed on each of the charge storage structures.


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