The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jan. 28, 2013
Nikon Corporation, Tokyo, JP;
Nobutaka Magome, Kumagaya, JP;
Naoyuki Kobayashi, Fukaya, JP;
Yasuyuki Sakakibara, Moriya, JP;
Hiroaki Takaiwa, Kumagaya, JP;
Hisatsune Kadota, Hachioji, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A liquid immersion exposure apparatus includes a movable member having a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under a projection optical system. A liquid immersion system has a supply path and a recovery path. The liquid immersion system supplies the liquid to a space between the projection optical system and the surface via the supply path and recovers the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path. A controller stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality. The abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area.