The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Sep. 04, 2011
Mikhail Gutin, Albany, NY (US);
Xu-ming Wang, Albany, NY (US);
Mikhail Gutin, Albany, NY (US);
Xu-Ming Wang, Albany, NY (US);
Applied Science Innovations, Inc., Troy, NY (US);
Abstract
An interferometry method and associated system and computerized media for testing samples under test including those with high aberrations, comprising: situating a sample under test between a tilt mirror and a reference mirror, the tilt mirror tiltable with at least one degree of freedom about at least one tilt mirror axis, and further translatable along an axial line defined by a direction of propagation of a test wavefront from a source thereof; propagating the test wavefront toward the tilt mirror; after the test wavefront has been reflected by the tilt mirror, further propagating the test wavefront toward a reference mirror; and deriving a substantially complete first-tilt-alignment wavefront metrology of the sample under test from a plurality of first-tilt-alignment interferograms taken with the tilt mirror held fixed at a first predetermined tilt mirror angle while discreetly varying a displacement between the sample under test and the reference mirror.