The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Jan. 19, 2012
Apparatus and method for improving the intensity profile of a beam image used to process a substrate
Andrew M Hawryluk, Los Altos, CA (US);
Boris Grek, Hayward, CA (US);
David a Markle, Saratoga, CA (US);
Andrew M Hawryluk, Los Altos, CA (US);
Boris Grek, Hayward, CA (US);
David A Markle, Saratoga, CA (US);
Ultratech, Inc., San Jose, CA (US);
Abstract
Methods and apparatuses are provided for improving the intensity profile of a beam image used to process a semiconductor substrate. At least one photonic beam may be generated and manipulated to form an image having an intensity profile with an extended uniform region useful for thermally processing the surface of the substrate. The image may be scanned across the surface to heat at least a portion of the substrate surface to achieve a desired temperature within a predetermined dwell time. Such processing may achieve a high efficiency due to the large proportion of energy contained in the uniform portion of the beam.