The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Oct. 26, 2010
Hua-yu Liu, Palo Alto, CA (US);
Luoqi Chen, Saratoga, CA (US);
Hong Chen, San Jose, CA (US);
Zhi-pan LI, Los Gatos, CA (US);
Jun YE, Palo Alto, CA (US);
Min-chun Tsai, San Jose, CA (US);
Youping Zhang, Fremont, CA (US);
Yen-wen LU, Los Altos, CA (US);
Jiangwei LI, Palo Alto, CA (US);
Hua-Yu Liu, Palo Alto, CA (US);
Luoqi Chen, Saratoga, CA (US);
Hong Chen, San Jose, CA (US);
Zhi-Pan Li, Los Gatos, CA (US);
Jun Ye, Palo Alto, CA (US);
Min-Chun Tsai, San Jose, CA (US);
Youping Zhang, Fremont, CA (US);
Yen-Wen Lu, Los Altos, CA (US);
Jiangwei Li, Palo Alto, CA (US);
Other;
Abstract
The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.