The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Dec. 26, 2011
Yoshinori Nakayama, Sayama, JP;
Takashi Tase, Tokorozawa, JP;
Jiro Yamamoto, Tachikawa, JP;
Osamu Inoue, Kodaira, JP;
Yoshinori Nakayama, Sayama, JP;
Takashi Tase, Tokorozawa, JP;
Jiro Yamamoto, Tachikawa, JP;
Osamu Inoue, Kodaira, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A standard member for automatically, stably, and highly accurately performing magnification calibration used in an electron microscope, the standard member including, on the same plane, a multilayer film cross section formed by alternately laminating materials different from each other, a plurality of first mark patterns arranged across a first silicon layer and in parallel to the multilayer film cross section, at least a pair of second mark patterns arranged across a second silicon layer thicker than the first silicon layer on the opposite side of the first mark patterns with respect to the multilayer film cross section and in parallel to the multilayer film cross section, and a silicon layer arranged on the outer side of the first mark patterns and the second mark patterns with respect to the multilayer film cross section.