The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2014

Filed:

Sep. 23, 2011
Applicants:

Jeong-hee Park, Hwaseong-si, KR;

Man-sug Kang, Suwon-si, KR;

Hideki Horii, Seoul, KR;

Hyo-jung Kim, Hwaseong-si, KR;

Jung-hwan Park, Seoul, KR;

Inventors:

Jeong-Hee Park, Hwaseong-si, KR;

Man-Sug Kang, Suwon-si, KR;

Hideki Horii, Seoul, KR;

Hyo-Jung Kim, Hwaseong-si, KR;

Jung-Hwan Park, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/06 (2006.01); H01L 45/00 (2006.01);
U.S. Cl.
CPC ...
H01L 45/06 (2013.01); H01L 45/14 (2013.01); H01L 45/141 (2013.01);
Abstract

An example embodiment relates to a method including forming a bottom electrode and an insulating layer on a substrate, the insulating layer defining a first opening that exposes a portion of the bottom electrode. The method includes forming a variable resistance material pattern, including a plurality of elements, to fill the first opening. The variable resistance material pattern may be doped with a dopant that includes at least one of the plurality of elements in the variable resistance material pattern. The method includes forming a top electrode on the variable resistance material pattern.


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