The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2014

Filed:

Dec. 28, 2012
Applicants:

Minoru Harada, Fujisawa, JP;

Ryo Nakagaki, Kawasaki, JP;

Kenji Obara, Kawasaki, JP;

Atsushi Miyamoto, Yokohama, JP;

Inventors:

Minoru Harada, Fujisawa, JP;

Ryo Nakagaki, Kawasaki, JP;

Kenji Obara, Kawasaki, JP;

Atsushi Miyamoto, Yokohama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G06T 7/004 (2013.01); G06T 7/001 (2013.01); G01N 21/9501 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Disclosed is a method for reviewing defects in a large number of samples within a short period of time through the use of a defect review apparatus. To collect defect images steadily and at high throughput, a defect detection method is selected before imaging and set up for each of review target defects in the samples in accordance with the external characteristics of the samples that are calculated from the design information about the samples. The defect images are collected after an imaging sequence is set up for the defect images and reference images in such a manner as to reduce the time required for stage movement in accordance with the defect coordinates of the samples and the selected defect detection method.


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