The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Mar. 19, 2009
Thomas Scheruebl, Jena, DE;
Holger Seitz, Jena, DE;
Ulrich Matejka, Jena, DE;
Axel Zibold, Jena, DE;
Rigo Richter, Zeulenroda-Triebes, DE;
Thomas Scheruebl, Jena, DE;
Holger Seitz, Jena, DE;
Ulrich Matejka, Jena, DE;
Axel Zibold, Jena, DE;
Rigo Richter, Zeulenroda-Triebes, DE;
Carl Zeiss SMS GmbH, Jena, DE;
Abstract
The invention relates to a method and an apparatus for measuring masks for photolithography. In this case, structures to be measured on the mask on a movable mask carrier are illuminated and imaged as an aerial image onto a detector, the illumination being set in a manner corresponding to the illumination in a photolithography scanner during a wafer exposure. A selection of positions at which the structures to be measured are situated on the mask is predetermined, and the positions on the mask in the selection are successively brought to the focus of an imaging optical system, where they are illuminated and in each case imaged as a magnified aerial image onto a detector, and the aerial images are subsequently stored. The structure properties of the structures are then analyzed by means of predetermined evaluation algorithms. The accuracy of the setting of the positions and of the determination of structure properties is increased in this case.