The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2014

Filed:

May. 24, 2011
Applicants:

Ichiro Ishimaru, Mure, JP;

Minori Noguchi, Mitsukaidou, JP;

Ichiro Moriyama, Hamura, JP;

Yoshikazu Tanabe, Irima, JP;

Yasuo Yatsugake, Kamisato, JP;

Yukio Kenbou, Tokyo, JP;

Kenji Watanabe, Oume, JP;

Hirofumi Tsuchiyama, Hitachinaka, JP;

Inventors:

Ichiro Ishimaru, Mure, JP;

Minori Noguchi, Mitsukaidou, JP;

Ichiro Moriyama, Hamura, JP;

Yoshikazu Tanabe, Irima, JP;

Yasuo Yatsugake, Kamisato, JP;

Yukio Kenbou, Tokyo, JP;

Kenji Watanabe, Oume, JP;

Hirofumi Tsuchiyama, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
Abstract

A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.


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