The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Feb. 09, 2009
Applicants:
Irwan Dani Setija, Utrecht, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Inventors:
Irwan Dani Setija, Utrecht, NL;
Maurits Van Der Schaar, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus and method to determine overlay of a target on a substrate () by measuring, in the pupil plane () of a high numerical aperture len (L), an angle-resolved spectrum as a result of radiation being reflected off the substrate. The overlay is determined from the anti-symmetric component of the spectrum, which is formed by subtracting the measured spectrum and a mirror image of the measured spectrum. The measured spectrum may contain only zeroth order reflected radiation from the target.