The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2014

Filed:

Jan. 31, 2012
Applicants:

Weiping Fang, Fremont, CA (US);

Jun Zhu, Fremont, CA (US);

Paul C. Liu, Saratoga, CA (US);

Yuli Xue, Shanghai, CN;

KE Fan, Shanghai, CN;

Inventors:

Weiping Fang, Fremont, CA (US);

Jun Zhu, Fremont, CA (US);

Paul C. Liu, Saratoga, CA (US);

Yuli Xue, Shanghai, CN;

Ke Fan, Shanghai, CN;

Assignee:

Synopsys, Inc., Mountain View, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/64 (2006.01);
U.S. Cl.
CPC ...
Abstract

A two-level matching technique is described. A system can generate a set of index patterns based on a set of library patterns in a pattern library. The pattern library can include patterns that are expected to have problems during manufacturing. Next, the system can use a fast matching process to check if a first-level pattern clip potentially matches one or more index patterns from the set of index patterns. If so, the system can use a detailed matching process to match a second-level pattern clip with library patterns that correspond to the one or more index patterns. Otherwise, the system can report that the first-level pattern clip does not match any library pattern in the pattern library.


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