The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2014

Filed:

May. 23, 2008
Applicants:

Yasuhito Narushima, Omura, JP;

Shinichi Kawazoe, Omura, JP;

Fukuo Ogawa, Omura, JP;

Toshimichi Kubota, Omura, JP;

Inventors:

Yasuhito Narushima, Omura, JP;

Shinichi Kawazoe, Omura, JP;

Fukuo Ogawa, Omura, JP;

Toshimichi Kubota, Omura, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 15/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A doping device includes a first dopant accommodating portion including an opening on an upper portion to accommodate a first dopant that is evaporated near a surface of a semiconductor melt; a second dopant accommodating portion including a dopant holder that holds a second dopant that is liquefied near the surface of the semiconductor melt while including a communicating hole for delivering the liquefied dopant downwardly, and a conduit tube provided on a lower portion of the dopant holder for delivering the liquefied dopant flowed from the communicating hole to the surface of the semiconductor melt; and a guide provided by a cylinder body of which a lower end is opened and an upper end is closed for guiding dopant gas generated by evaporation of the first dopant to the surface of the semiconductor melt.


Find Patent Forward Citations

Narushima, Yasuhito. (2014). Doping apparatus for simultaneously injecting two dopants into a semiconductor melt at different positions and method for manufacturing silicon single crystal using the doping apparatus (U.S. Patent No. 8715416). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8715416

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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