The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Jan. 24, 2011
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Felix Godfried Peter Peeters, Lieshout, NL;
Bob Streefkerk, Tilburg, NL;
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Helmar Van Santen, Amsterdam, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Felix Godfried Peter Peeters, Lieshout, NL;
Bob Streefkerk, Tilburg, NL;
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Helmar Van Santen, Amsterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile