The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Oct. 28, 2011
Hayato Namai, Tokyo, JP;
Hiroki Nakagawa, Tokyo, JP;
Kentaro Harada, Tokyo, JP;
Takehiko Naruoka, Tokyo, JP;
Hayato Namai, Tokyo, JP;
Hiroki Nakagawa, Tokyo, JP;
Kentaro Harada, Tokyo, JP;
Takehiko Naruoka, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.