The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
May. 14, 2009
Applicants:
Hye-young Park, Gyeonggi-do, KR;
Sung-lae Cho, Gyeonggi-do, KR;
Jin-il Lee, Gyeonggi-do, KR;
Do-hyung Kim, Gyeonggi-do, KR;
Dong-hyun Im, Gyeonggi-do, KR;
Inventors:
Hye-young Park, Gyeonggi-do, KR;
Sung-lae Cho, Gyeonggi-do, KR;
Jin-il Lee, Gyeonggi-do, KR;
Do-hyung Kim, Gyeonggi-do, KR;
Dong-hyun Im, Gyeonggi-do, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided are methods of forming a material layer by chemically adsorbing metal atoms to a substrate having anions formed on the surface thereof, and a method of fabricating a memory device by using the material layer forming method. Accordingly, a via hole with a small diameter can be filled with a material layer without forming voids or seams. Thus, a reliable memory device can be obtained.