The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Sep. 29, 2008
Kenichi Imakita, Tsukuba, JP;
Tadashi Morita, Tsukuba, JP;
Hiroki Yamamoto, Susono, JP;
Naoki Morimoto, Susono, JP;
Ayao Nabeya, Susono, JP;
Shinya Nakamura, Loyang Way, SG;
Kenichi Imakita, Tsukuba, JP;
Tadashi Morita, Tsukuba, JP;
Hiroki Yamamoto, Susono, JP;
Naoki Morimoto, Susono, JP;
Ayao Nabeya, Susono, JP;
Shinya Nakamura, Loyang Way, SG;
Ulvac, Inc., Kanagawa, JP;
Abstract
A film formation apparatus and film formation method that improve film thickness uniformity. A rotation mechanism holds a target having a sputtered surface in a state inclined relative to a surface of a substrate. The rotation mechanism rotatably supports the target about an axis extending along a normal of the sputtered surface. The target supported by the rotation mechanism is sputtered to form a thin film on the surface of the substrate. When forming the thin film, the rotation mechanism maintains the rotational angle of the target.