The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2014

Filed:

Aug. 15, 2012
Applicants:

Toshihiko Nakata, Yokohama, JP;

Masahiro Watanabe, Yokohama, JP;

Takashi Inoue, Yokohama, JP;

Kishio Hidaka, Hitachi, JP;

Motoyuki Hirooka, Hitachi, JP;

Inventors:

Toshihiko Nakata, Yokohama, JP;

Masahiro Watanabe, Yokohama, JP;

Takashi Inoue, Yokohama, JP;

Kishio Hidaka, Hitachi, JP;

Motoyuki Hirooka, Hitachi, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 70/00 (2010.01); G01Q 70/16 (2010.01); G01N 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.


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