The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2014

Filed:

Feb. 09, 2011
Applicants:

Zhigang Wang, Hitachinaka, JP;

Nobuhiro Okai, Kokubunji, JP;

Ritsuo Fukaya, Hitachinaka, JP;

Inventors:

Zhigang Wang, Hitachinaka, JP;

Nobuhiro Okai, Kokubunji, JP;

Ritsuo Fukaya, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A scanning electron microscope and an optical-condition setting method are provided. The optical condition allows the suppression of a lowering in the measurement and inspection accuracy caused by the influence of electrification, even if there are a large number of measurement and inspection points. A pattern on a sample is measured based on the detection of electrons by scanning the sample surface with an electron beam. A change in measurement values relative to the number of measurements is determined from the measurement values at a plurality of measurement points on the sample, and the sample-surface electric field is controlled so that the inclination of the change becomes equal to zero, or becomes close to zero.


Find Patent Forward Citations

Loading…