The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Sep. 22, 2009
Peter Christiaan Tiemeijer, Eindhoven, NL;
Uwe Luecken, Eindhoven, NL;
Alan Frank DE Jong, Eindhoven, NL;
Hendrik Nicolaas Slingerland, Venlo, NL;
Peter Christiaan Tiemeijer, Eindhoven, NL;
Uwe Luecken, Eindhoven, NL;
Alan Frank de Jong, Eindhoven, NL;
Hendrik Nicolaas Slingerland, Venlo, NL;
FEI Company, Hillsboro, OR (US);
Abstract
The invention relates to a method for correcting distortions introduced by the projection system () of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain. To this end the invention discloses a detector equipped with multipoles (), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen () for detecting the electrons.