The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Mar. 14, 2013
Plasma-therm Llc, St. Petersburg, FL (US);
Dwarakanath Geerpuram, St. Petersburg, FL (US);
David Pays-Volard, St. Petersburg, FL (US);
Linnell Martinez, Lakeland, FL (US);
Chris Johnson, St. Petersburg, FL (US);
David Johnson, Cleveland, GA (US);
Russell Westerman, Land O' Lakes, FL (US);
Plasma-Therm LLC, St. Petersburg, FL (US);
Abstract
The present invention provides a method for plasma processing a substrate. The method comprising providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; loading a work piece onto the work piece support, the work piece having a support film, a frame and the substrate; providing a cover ring above the work piece, the cover ring having at least one perforated region, and at least one non-perforated region; generating a plasma using the plasma source; and processing the work piece using the generated plasma.