The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2014

Filed:

Jun. 18, 2012
Applicants:

Hsin-yu Chen, Nantou County, TW;

Yu-han Tsai, Kaohsiung, TW;

Chun-ling Lin, Tainan, TW;

Ching-li Yang, Pingtung County, TW;

Home-been Cheng, Keelung, TW;

Inventors:

Hsin-Yu Chen, Nantou County, TW;

Yu-Han Tsai, Kaohsiung, TW;

Chun-Ling Lin, Tainan, TW;

Ching-Li Yang, Pingtung County, TW;

Home-Been Cheng, Keelung, TW;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of processing a substrate is provided. The method includes: providing a substrate, wherein the substrate includes a silicon layer; etching the substrate to form a cavity; filling a first conductor in part of the cavity; performing a first thermal treatment on the first conductor; filling a second conductor in the cavity to fill-up the cavity; and performing a second thermal treatment on the first conductor and the second conductor.


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