The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Sep. 11, 2012
Applicants:
Yousuke Konno, Tokyo, JP;
Nakaatsu Yoshimura, Tokyo, JP;
Fumihiro Toyokawa, Tokyo, JP;
Hikaru Sugita, Tokyo, JP;
Inventors:
Yousuke Konno, Tokyo, JP;
Nakaatsu Yoshimura, Tokyo, JP;
Fumihiro Toyokawa, Tokyo, JP;
Hikaru Sugita, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a resist under layer film includes providing a composition for forming a resist under layer film on a substrate which is to be processed. The composition includes a solvent and a calixarene compound or a derivative of the calixarene compound. The composition is set under an oxidizing atmosphere with an oxygen content of 1% or more by volume to form a resist under layer film.