The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2014

Filed:

May. 28, 2009
Applicants:

Souichi Katagiri, Kodaira, JP;

Takashi Ohshima, Saitama, JP;

Sho Takami, Hitachinaka, JP;

Makoto Ezumi, Mito, JP;

Takashi Doi, Hitachinaka, JP;

Yuji Kasai, Hitachinaka, JP;

Inventors:

Souichi Katagiri, Kodaira, JP;

Takashi Ohshima, Saitama, JP;

Sho Takami, Hitachinaka, JP;

Makoto Ezumi, Mito, JP;

Takashi Doi, Hitachinaka, JP;

Yuji Kasai, Hitachinaka, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10to 10Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles. The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.


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