The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Oct. 25, 2011
Torsten Huisinga, Dresden, DE;
Jens Heinrich, Wachau, DE;
Ronny Pfuetzner, Dresden, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
One method disclosed herein includes the steps of forming a ULK material layer, forming a hard mask layer above the ULK material layer, forming a patterned photoresist layer above the hard mask layer, performing at least one etching process to define an opening in at least the ULK material layer for a conductive structure to be positioned in at least the ULK material layer, forming a fill material such that it overfills the opening, performing a process operation to remove the patterned photoresist layer and to remove the fill material positioned outside of the opening, removing the fill material from within the opening and, after removing the fill material from within the opening, forming a conductive structure in the opening.