The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Aug. 03, 2011
Stephan Kronholz, Dresden, DE;
Rohit Pal, Dresden, DE;
Stephan Kronholz, Dresden, DE;
Rohit Pal, Dresden, DE;
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
When forming sophisticated high-k metal gate electrode structures, the uniformity of the device characteristics may be enhanced by growing a threshold adjusting semiconductor alloy on the basis of a hard mask regime, which may result in a less pronounced surface topography, in particular in densely packed device areas. To this end, in some illustrative embodiments, a deposited hard mask material may be used for selectively providing an oxide mask of reduced thickness and superior uniformity.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile