The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2014
Filed:
Mar. 30, 2012
Yusuke Anno, Tokyo, JP;
Takashi Mori, Tokyo, JP;
Hirokazu Sakakibara, Tokyo, JP;
Taiichi Furukawa, Tokyo, JP;
Kazunori Takanashi, Tokyo, JP;
Hiromitsu Tanaka, Tokyo, JP;
Shin-ya Minegishi, Tokyo, JP;
Yusuke Anno, Tokyo, JP;
Takashi Mori, Tokyo, JP;
Hirokazu Sakakibara, Tokyo, JP;
Taiichi Furukawa, Tokyo, JP;
Kazunori Takanashi, Tokyo, JP;
Hiromitsu Tanaka, Tokyo, JP;
Shin-ya Minegishi, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.