The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2014

Filed:

Jan. 28, 2011
Applicants:

Masakatsu Hasuda, Chiba, JP;

Atsushi Uemoto, Chiba, JP;

Toshiaki Fujii, Chiba, JP;

Junichi Tashiro, Chiba, JP;

Inventors:

Masakatsu Hasuda, Chiba, JP;

Atsushi Uemoto, Chiba, JP;

Toshiaki Fujii, Chiba, JP;

Junichi Tashiro, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/29 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam


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