The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Jun. 28, 2010
Young J. Paik, Campbell, CA (US);
Christopher R. Mahon, San Bruno, CA (US);
Ashish Bhatnagar, Fremont, CA (US);
Kadthala Ramaya Narendrnath, San Jose, CA (US);
Young J. Paik, Campbell, CA (US);
Christopher R. Mahon, San Bruno, CA (US);
Ashish Bhatnagar, Fremont, CA (US);
Kadthala Ramaya Narendrnath, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.