The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Apr. 05, 2012
Wilhelm Ulrich, Aalen, DE;
Thomas Okon, Aalen, DE;
Norbert Wabra, Werneck, DE;
Toralf Gruner, Aalen-Hofen, DE;
Boris Bittner, Roth, DE;
Volker Graeschus, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Thomas Okon, Aalen, DE;
Norbert Wabra, Werneck, DE;
Toralf Gruner, Aalen-Hofen, DE;
Boris Bittner, Roth, DE;
Volker Graeschus, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hH to marginal ray height hR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hH to marginal ray height hR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.