The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Dec. 16, 2010
Niek Jacobus Johannes Roset, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Alexander Nikolov Zdravkov, Eindhoven, NL;
Niek Jacobus Johannes Roset, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Raymond Wilhelmus Louis Lafarre, Helmond, NL;
Alexander Nikolov Zdravkov, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which includes, in cross-section, a feature, and has an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.