The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
May. 16, 2011
Peter Kurunczi, Cambridge, MA (US);
Frank Sinclair, Quincy, MA (US);
Costel Biloiu, Rockport, MA (US);
Ludovic Godet, Boston, MA (US);
Ernest Allen, Rockport, MA (US);
Peter Kurunczi, Cambridge, MA (US);
Frank Sinclair, Quincy, MA (US);
Costel Biloiu, Rockport, MA (US);
Ludovic Godet, Boston, MA (US);
Ernest Allen, Rockport, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
A plasma processing apparatus and method are disclosed which create a uniform plasma within an enclosure. In one embodiment, a conductive or ferrite material is used to influence a section of the antenna, where a section is made up of portions of multiple coiled segments. In another embodiment, a ferrite material is used to influence a portion of the antenna. In another embodiment, plasma uniformity is improved by modifying the internal shape and volume of the enclosure.