The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Feb. 16, 2011
Lawrence D. Rotter, Pleasanton, CA (US);
David Y. Wang, Santa Clara, CA (US);
Lawrence D. Rotter, Pleasanton, CA (US);
David Y. Wang, Santa Clara, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A method for optically inspecting a specimen by directing a probe beam onto the specimen at varying angle of incidence and azimuth angle, thereby producing a reflected probe beam, gathering the reflected probe beam, separating the reflected probe beam as a function of wavelength, adding astigmatism to separate the reflected probe beam as a function of at least one of the angle of incidence and the azimuth angle, and evaluating the specimen based at least on changes in the reflected probe beam as a function of wavelength of the reflected probe beam and at least one of the angle of incidence and the azimuth angle.