The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Dec. 22, 2010
Christiaan Alexander Hoogendam, Veldhoven, NL;
Bob Streefkerk, Tilburg, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Bernardus Antonius Slaghekke, Veldhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Helmar Van Santen, Amsterdam, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Bob Streefkerk, Tilburg, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Bernardus Antonius Slaghekke, Veldhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Helmar Van Santen, Amsterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile