The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2014

Filed:

Sep. 14, 2012
Applicants:

Abhishek Dube, Hopewell Junction, NY (US);

Subramanian S. Iyer, Hopewell Junction, NY (US);

Babar Ali Khan, Hopewell Junction, NY (US);

Oh-jung Kwon, Hopewell Junction, NY (US);

Junedong Lee, Hopewell Junction, NY (US);

Paul C. Parries, Hopewell Junction, NY (US);

Chengwen Pei, Hopewell Junction, NY (US);

Gerd Pfeiffer, Hopewell Junction, NY (US);

Ravi Todi, Hopewell Junction, NY (US);

Geng Wang, Hopewell Junction, NY (US);

Inventors:

Abhishek Dube, Hopewell Junction, NY (US);

Subramanian S. Iyer, Hopewell Junction, NY (US);

Babar Ali Khan, Hopewell Junction, NY (US);

Oh-jung Kwon, Hopewell Junction, NY (US);

Junedong Lee, Hopewell Junction, NY (US);

Paul C. Parries, Hopewell Junction, NY (US);

Chengwen Pei, Hopewell Junction, NY (US);

Gerd Pfeiffer, Hopewell Junction, NY (US);

Ravi Todi, Hopewell Junction, NY (US);

Geng Wang, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A structure and method for forming isolation and a buried plate for a trench capacitor is disclosed. Embodiments of the structure comprise an epitaxial layer serving as the buried plate, and a bounded deep trench isolation area serving to isolate one or more deep trench structures. Embodiments of the method comprise angular implanting of the deep trench isolation area to form a P region at the base of the deep trench isolation area that serves as an anti-punch through implant.


Find Patent Forward Citations

Loading…