The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
Aug. 07, 2012
Jensheng Huang, San Jose, CA (US);
Xin Zheng, Sunnyvale, CA (US);
Chun-chieh Kuo, Hsinchu, TW;
Synopsys, Inc., Mountain View, CA (US);
Abstract
A method of calibrating a compact model for a lithographic process is described. In this method, the nominal compact model can be provided. Notably, an input energy effect can be separated from chemical effects and other factors regarding the photoresist. Using a processor, the compact model can be calibrated based on the input energy, thereby generating an energy-sensitive compact model. The energy-sensitive compact model can quickly construct 3D resist profiles capturing resist profile degradation at any horizontal plane. Because this method does not change any form of compact modeling, it can be integrated as is into validation and correction processes. In other embodiments, the energy-sensitive compact model can be further calibrated based on one or more of the chemical effects and/or other factors.