The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
May. 28, 2010
Richard Carl Zimmerman, Brookfield, CT (US);
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Peter C. Kochersperger, Easton, CT (US);
Todd R. Downey, Monroe, CT (US);
Elizabeth Stone, Stamford, CT (US);
Szilard Istvan Csiszar, Veldhoven, NL;
Frederick Kubick, Redding, CT (US);
Olga Vladimirsky, Weston, CT (US);
Richard Carl Zimmerman, Brookfield, CT (US);
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Peter C. Kochersperger, Easton, CT (US);
Todd R. Downey, Monroe, CT (US);
Elizabeth Stone, Stamford, CT (US);
Szilard Istvan Csiszar, Veldhoven, NL;
Frederick Kubick, Redding, CT (US);
Olga Vladimirsky, Weston, CT (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.